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Effect of pulsed magnetron sputtering process for the deposition of thin layers of nickel and nickel oxide

Witold Posadowski

Witold Posadowski

Faculty of Microsystem Electronics and Photonics,Wroclaw, Poland
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Posadowski, Witold
, 
Artur Wiatrowski

Artur Wiatrowski

Faculty of Microsystem Electronics and Photonics,Wroclaw, Poland
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Wiatrowski, Artur
 and 
Grzegorz Kapka

Grzegorz Kapka

Faculty of Microsystem Electronics and Photonics,Wroclaw, Poland
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Kapka, Grzegorz
  
May 18, 2018
Effect of pulsed magnetron sputtering process for the deposition of thin layers of nickel and nickel oxide's Cover Image
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Published Online: May 18, 2018
Page range: 69 - 74
Received: Mar 24, 2017
Accepted: Oct 11, 2017
DOI: https://doi.org/10.1515/msp-2017-0092
Keywords
© 2018
This work is licensed under the Creative Commons Attribution-NonCommercial-NoDerivatives 4.0 License.
Language:
English
Publication timeframe:
4 times per year
Journal Subjects:
Materials Sciences, Materials Sciences, other, Nanomaterials, Functional and Smart Materials, Materials Characterization and Properties
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