Effect of pulsed magnetron sputtering process for the deposition of thin layers of nickel and nickel oxide

Publié en ligne: 18 mai 2018

Pages: 69 - 74

Reçu: 24 mars 2017

Accepté: 11 oct. 2017

DOI: https://doi.org/10.1515/msp-2017-0092

Mots clés

pulsed magnetron sputtering, thin film, deposition, nickel, nickel oxide

© 2018

This work is licensed under the Creative Commons Attribution-NonCommercial-NoDerivatives 4.0 License.