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Effect of pulsed magnetron sputtering process for the deposition of thin layers of nickel and nickel oxide

Witold Posadowski

Witold Posadowski

Faculty of Microsystem Electronics and Photonics,Wroclaw, Poland
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Posadowski, Witold
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Artur Wiatrowski

Artur Wiatrowski

Faculty of Microsystem Electronics and Photonics,Wroclaw, Poland
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Wiatrowski, Artur
 and 
Grzegorz Kapka

Grzegorz Kapka

Faculty of Microsystem Electronics and Photonics,Wroclaw, Poland
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Kapka, Grzegorz
  
May 18, 2018
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Published Online: May 18, 2018
Page range: 69 - 74
Received: Mar 24, 2017
Accepted: Oct 11, 2017
DOI: https://doi.org/10.1515/msp-2017-0092
Keywords
© 2018
This work is licensed under the Creative Commons Attribution-NonCommercial-NoDerivatives 4.0 License.
Posadowski, Witold
Faculty of Microsystem Electronics and Photonics,Wroclaw, Poland
Wiatrowski, Artur
Faculty of Microsystem Electronics and Photonics,Wroclaw, Poland
Kapka, Grzegorz
Faculty of Microsystem Electronics and Photonics,Wroclaw, Poland
Language:
English
Publication timeframe:
4 times per year
Journal Subjects:
Materials Sciences, Materials Sciences, other, Nanomaterials, Functional and Smart Materials, Materials Characterization and Properties
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