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Methods of optimization of reactive sputtering conditions of Al target during AlN films deposition

Rafal Chodun

Rafal Chodun

Faculty of Materials Science and Engineering, Warsaw University of TechnologyWarsaw, Poland
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Chodun, Rafal
, 
Katarzyna Nowakowska-Langier

Katarzyna Nowakowska-Langier

National Centre for Nuclear Research (NCBJ)Otwock-Swierk, Poland
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Nowakowska-Langier, Katarzyna
 and 
Krzysztof Zdunek

Krzysztof Zdunek

Faculty of Materials Science and Engineering, Warsaw University of TechnologyWarsaw, Poland
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Zdunek, Krzysztof
  
Jan 06, 2016
Methods of optimization of reactive sputtering conditions of Al target during AlN films deposition's Cover Image
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Published Online: Jan 06, 2016
Page range: 894 - 901
Received: May 31, 2015
Accepted: Oct 05, 2015
DOI: https://doi.org/10.1515/msp-2015-0116
Keywords
© 2015 Rafal Chodun et al., published by De Gruyter Open
This work is licensed under the Creative Commons Attribution-NonCommercial-NoDerivatives 3.0 License.
Language:
English
Publication timeframe:
4 times per year
Journal Subjects:
Materials Sciences, Materials Sciences, other, Nanomaterials, Functional and Smart Materials, Materials Characterization and Properties
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