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Controlled fluoridation of amorphous carbon films deposited at reactive plasma conditions

Alexander Yoffe

Alexander Yoffe

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Yoffe, Alexander
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Ilya Zon

Ilya Zon

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Zon, Ilya
, 
Yishay Feldman

Yishay Feldman

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Feldman, Yishay
 and 
Victor Shelukhin

Victor Shelukhin

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Shelukhin, Victor
  
Aug 30, 2016
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Published Online: Aug 30, 2016
Page range: 606 - 611
Received: Jan 13, 2014
Accepted: May 31, 2015
DOI: https://doi.org/10.1515/msp-2015-0088
Keywords
© 2016
This work is licensed under the Creative Commons Attribution-NonCommercial-NoDerivatives 3.0 License.
Yoffe, Alexander
Zon, Ilya
Feldman, Yishay
Shelukhin, Victor
Language:
English
Publication timeframe:
4 times per year
Journal Subjects:
Materials Sciences, Materials Sciences, other, Nanomaterials, Functional and Smart Materials, Materials Characterization and Properties
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