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Materials Science-Poland
Volume 33 (2015): Issue 3 (September 2015)
Open Access
Controlled fluoridation of amorphous carbon films deposited at reactive plasma conditions
Alexander Yoffe
Alexander Yoffe
,
Ilya Zon
Ilya Zon
,
Yishay Feldman
Yishay Feldman
and
Victor Shelukhin
Victor Shelukhin
| Aug 30, 2016
Materials Science-Poland
Volume 33 (2015): Issue 3 (September 2015)
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Published Online:
Aug 30, 2016
Page range:
606 - 611
Received:
Jan 13, 2014
Accepted:
May 31, 2015
DOI:
https://doi.org/10.1515/msp-2015-0088
Keywords
carbon deposition
,
reactive plasma
,
fluoridation
© 2016
This work is licensed under the Creative Commons Attribution-NonCommercial-NoDerivatives 3.0 License.