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Acta Universitatis Sapientiae, Electrical and Mechanical Engineering
Volume 8 (2016): Issue 1 (December 2016)
Open Access
Macroscopic Thin Film Deposition Model for the Two-Reactive-Gas Sputtering Process
András Kelemen
András Kelemen
Department of Electrical Engineering, Faculty of Technical and Human Sciences, Sapientia Hungarian University of Transylvania
Tg. Mureş,
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Kelemen, András
,
Domokos Biró
Domokos Biró
Department of Mechanical Engineering, Faculty of Technical and Human Sciences, Sapientia Hungarian University of Transylvania
Tg. Mureş,
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Biró, Domokos
,
Albert-Zsombor Fekete
Albert-Zsombor Fekete
Department of Electrical Engineering, Faculty of Technical and Human Sciences, Sapientia Hungarian University of Transylvania
Tg. Mureş,
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Fekete, Albert-Zsombor
,
László Jakab-Farkas
László Jakab-Farkas
Department of Electrical Engineering, Faculty of Technical and Human Sciences, Sapientia Hungarian University of Transylvania
Tg. Mureş,
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Jakab-Farkas, László
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Róbert Rossi Madarász
Róbert Rossi Madarász
Department of Electrical Engineering, Faculty of Technical and Human Sciences, Sapientia Hungarian University of Transylvania
Tg. Mureş,
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Madarász, Róbert Rossi
Sep 09, 2017
Acta Universitatis Sapientiae, Electrical and Mechanical Engineering
Volume 8 (2016): Issue 1 (December 2016)
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Published Online:
Sep 09, 2017
Page range:
62 - 78
Received:
Feb 15, 2017
DOI:
https://doi.org/10.1515/auseme-2017-0005
Keywords
DC magnetron sputtering
,
thin film deposition
,
reactive sputtering
,
macroscopic modelling
© 2016 András Kelemen et al., published by De Gruyter Open
This work is licensed under the Creative Commons Attribution-NonCommercial-NoDerivatives 3.0 License.
