Surface morphology of titanium nitride thin films synthesized by DC reactive magnetron sputtering

Publicado en línea: 13 mar 2015

Páginas: 137 - 143

Recibido: 25 jul 2014

Aceptado: 07 oct 2014

DOI: https://doi.org/10.1515/msp-2015-0010

Palabras clave

atomic force microscopy (AFM), DC reactive magnetron sputtering, fractal analysis, surface roughness, titanium nitride (TiN) thin film

© 2015

This work is licensed under the Creative Commons Attribution-NonCommercial-NoDerivatives 3.0 License.