Surface morphology of titanium nitride thin films synthesized by DC reactive magnetron sputtering

Pubblicato online: 13 mar 2015

Pagine: 137 - 143

Ricevuto: 25 lug 2014

Accettato: 07 ott 2014

DOI: https://doi.org/10.1515/msp-2015-0010

Parole chiave

atomic force microscopy (AFM), DC reactive magnetron sputtering, fractal analysis, surface roughness, titanium nitride (TiN) thin film

© 2015

This work is licensed under the Creative Commons Attribution-NonCommercial-NoDerivatives 3.0 License.