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Preparation and microstructural characterization of Si(100) Ce1−x GdxO2−δ thin films prepared by pulsed laser deposition technique

P. Nagaraju

P. Nagaraju

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Nagaraju, P.
, 
Y. Vijayakumar

Y. Vijayakumar

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Vijayakumar, Y.
, 
D. Phase

D. Phase

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Phase, D.
, 
V. Reddy

V. Reddy

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Reddy, V.
 and 
M. Ramana Reddy

M. Ramana Reddy

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Ramana Reddy, M.
  
Dec 19, 2014
Preparation and microstructural characterization of Si(100) Ce1−x GdxO2−δ thin films prepared by pulsed laser deposition technique's Cover Image
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Published Online: Dec 19, 2014
Page range: 541 - 546
DOI: https://doi.org/10.2478/s13536-014-0246-5
Keywords
© 2014 Wroclaw University of Technology
This work is licensed under the Creative Commons Attribution-NonCommercial-NoDerivatives 3.0 License.
Nagaraju, P.
Vijayakumar, Y.
Phase, D.
Reddy, V.
Ramana Reddy, M.
Language:
English
Publication timeframe:
4 times per year
Journal Subjects:
Materials Sciences, Materials Sciences, other, Nanomaterials, Functional and Smart Materials, Materials Characterization and Properties
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