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Investigation of structural, optical and electrical properties of (Ti,Nb)Ox thin films deposited by high energy reactive magnetron sputtering

Michal Mazur

Michal Mazur

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Mazur, Michal
, 
Danuta Kaczmarek

Danuta Kaczmarek

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Kaczmarek, Danuta
, 
Eugeniusz Prociow

Eugeniusz Prociow

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Prociow, Eugeniusz
, 
Jaroslaw Domaradzki

Jaroslaw Domaradzki

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Domaradzki, Jaroslaw
, 
Damian Wojcieszak

Damian Wojcieszak

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Wojcieszak, Damian
 and 
Jakub Bocheński

Jakub Bocheński

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Bocheński, Jakub
  
Oct 17, 2014
Investigation of structural, optical and electrical properties of (Ti,Nb)Ox thin films deposited by high energy reactive magnetron sputtering's Cover Image
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Published Online: Oct 17, 2014
Page range: 457 - 464
DOI: https://doi.org/10.2478/s13536-013-0195-4
Keywords
© 2014 Wroclaw University of Technology
This work is licensed under the Creative Commons Attribution-NonCommercial-NoDerivatives 3.0 License.
Mazur, Michal
Kaczmarek, Danuta
Prociow, Eugeniusz
Domaradzki, Jaroslaw
Wojcieszak, Damian
Bocheński, Jakub
Language:
English
Publication timeframe:
4 times per year
Journal Subjects:
Materials Sciences, Materials Sciences, other, Nanomaterials, Functional and Smart Materials, Materials Characterization and Properties
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