Investigation of structural, optical and electrical properties of (Ti,Nb)Ox thin films deposited by high energy reactive magnetron sputtering

Publicado en línea: 17 oct 2014

Páginas: 457 - 464

DOI: https://doi.org/10.2478/s13536-013-0195-4

Palabras clave

(Ti,Nb)Ox thin films, transparent oxide semiconductor, p-type electrical conduction, niobium doped titanium dioxide, transparent electronics

© 2014 Wroclaw University of Technology

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