Investigation of structural, optical and electrical properties of (Ti,Nb)Ox thin films deposited by high energy reactive magnetron sputtering

Pubblicato online: 17 ott 2014

Pagine: 457 - 464

DOI: https://doi.org/10.2478/s13536-013-0195-4

Parole chiave

(Ti,Nb)Ox thin films, transparent oxide semiconductor, p-type electrical conduction, niobium doped titanium dioxide, transparent electronics

© 2014 Wroclaw University of Technology

This work is licensed under the Creative Commons Attribution-NonCommercial-NoDerivatives 3.0 License.