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The influence of Kanthal wire surface defects on the formation of Si nanolayer deposited by PVD method

Mieczysław Szczypiński

Mieczysław Szczypiński

PPHU TERMEX sp. z o.o.,Koszalin, Poland
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Szczypiński, Mieczysław
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Kazimierz Reszka

Kazimierz Reszka

Koszalin University of Technology, 75-453Koszalin, Poland
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Reszka, Kazimierz
 and 
Michał M. Szczypiński

Michał M. Szczypiński

Technical University of Liberec, 461 17Liberec, Czech Republic
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Szczypiński, Michał M.
  
Jun 25, 2018
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Published Online: Jun 25, 2018
Page range: 264 - 269
Received: Mar 18, 2017
Accepted: Mar 15, 2018
DOI: https://doi.org/10.1515/msp-2018-0038
Keywords
© 2018 Mieczysław Szczypiński et al., published by Sciendo
This work is licensed under the Creative Commons Attribution-NonCommercial-NoDerivatives 4.0 License.
Szczypiński, Mieczysław
PPHU TERMEX sp. z o.o.,Koszalin, Poland
Reszka, Kazimierz
Koszalin University of Technology, 75-453Koszalin, Poland
Szczypiński, Michał M.
Technical University of Liberec, 461 17Liberec, Czech Republic
Language:
English
Publication timeframe:
4 times per year
Journal Subjects:
Materials Sciences, Materials Sciences, other, Nanomaterials, Functional and Smart Materials, Materials Characterization and Properties
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