The influence of Kanthal wire surface defects on the formation of Si nanolayer deposited by PVD method
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25 juin 2018
À propos de cet article
Publié en ligne: 25 juin 2018
Pages: 264 - 269
Reçu: 18 mars 2017
Accepté: 15 mars 2018
DOI: https://doi.org/10.1515/msp-2018-0038
Mots clés
© 2018 Mieczysław Szczypiński et al., published by Sciendo
This work is licensed under the Creative Commons Attribution-NonCommercial-NoDerivatives 4.0 License.
Szczypiński, Mieczysław
PPHU TERMEX sp. z o.o.,Koszalin, Poland
Reszka, Kazimierz
Koszalin University of Technology, 75-453Koszalin, Poland
Szczypiński, Michał M.
Technical University of Liberec, 461 17Liberec, Czech Republic