Fabrication of nano-patterns of photoresist by ultraviolet lithography and oxygen plasma
, , , oraz
26 lis 2020
O artykule
Kategoria artykułu: Papers
Data publikacji: 26 lis 2020
Zakres stron: 359 - 364
Otrzymano: 16 wrz 2020
DOI: https://doi.org/10.2478/jee-2020-0049
Słowa kluczowe
© 2020 E Cheng et al., published by Sciendo
This work is licensed under the Creative Commons Attribution-NonCommercial-NoDerivatives 3.0 License.
Cheng, E
School of Mechanical Engineering, Hebei University of TechnologyPR China
Research Institute for Structure Technology of Advanced Equipment, Hebei University of TechnologyPR China
Tang, Suzhou
School of Economics and Management, Tianjin University of Science and TechnologyChina
Zou, Helin
Key Laboratory for Micro/Nano Technology and Systems of Liaoning Province, Dalian University of TechnologyDalian, China
Zhang, Zhengyan
School of Mechanical Engineering, Hebei University of TechnologyPR China
Wang, Yao
School of Mechanical Engineering, Hebei University of TechnologyPR China
Research Institute for Structure Technology of Advanced Equipment, Hebei University of TechnologyPR China