Fabrication of nano-patterns of photoresist by ultraviolet lithography and oxygen plasma
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26 nov 2020
INFORMAZIONI SU QUESTO ARTICOLO
Categoria dell'articolo: Papers
Pubblicato online: 26 nov 2020
Pagine: 359 - 364
Ricevuto: 16 set 2020
DOI: https://doi.org/10.2478/jee-2020-0049
Parole chiave
© 2020 E Cheng et al., published by Sciendo
This work is licensed under the Creative Commons Attribution-NonCommercial-NoDerivatives 3.0 License.
Cheng, E
School of Mechanical Engineering, Hebei University of TechnologyPR China
Research Institute for Structure Technology of Advanced Equipment, Hebei University of TechnologyPR China
Tang, Suzhou
School of Economics and Management, Tianjin University of Science and TechnologyChina
Zou, Helin
Key Laboratory for Micro/Nano Technology and Systems of Liaoning Province, Dalian University of TechnologyDalian, China
Zhang, Zhengyan
School of Mechanical Engineering, Hebei University of TechnologyPR China
Wang, Yao
School of Mechanical Engineering, Hebei University of TechnologyPR China
Research Institute for Structure Technology of Advanced Equipment, Hebei University of TechnologyPR China