<abstract xmlns="http://www.w3.org/1999/xhtml"><p>In this paper the overview of the most important approximate methods for the optical characterization of inhomogeneous thin films is presented. The following approximate methods are introduced: Wentzel–Kramers–Brillouin–Jeffreys approximation, method based on substituting inhomogeneous thin films by multilayer systems, method based on modifying recursive approach and method utilizing multiple-beam interference model. Principles and mathematical formulations of these methods are described. A comparison of these methods is carried out from the practical point of view, <italic>ie</italic> advantages and disadvantages of individual methods are discussed. Examples of the optical characterization of three inhomogeneous thin films consisting of non-stoichiometric silicon nitride are introduced in order to illustrate efficiency and practical meaning of the presented approximate methods.</p></abstract>

In this paper the overview of the most important approximate methods for the optical characterization of inhomogeneous thin films is presented. The following approximate methods are introduced: Wentzel–Kramers–Brillouin–Jeffreys approximation, method based on substituting inhomogeneous thin films by multilayer systems, method based on modifying recursive approach and method utilizing multiple-beam interference model. Principles and mathematical formulations of these methods are described. A comparison of these methods is carried out from the practical point of view, ie advantages and disadvantages of individual methods are discussed. Examples of the optical characterization of three inhomogeneous thin films consisting of non-stoichiometric silicon nitride are introduced in order to illustrate efficiency and practical meaning of the presented approximate methods.

Approximate methods for the optical characterization of inhomogeneous thin films: Applications to silicon nitride films

Department of Physical Electronic, Faculty of Science

Journal of Electrical Engineering

This work is licensed under the Creative Commons Attribution-NonCommercial-NoDerivatives 4.0 License.

In this paper the overview of the most important approximate methods for the optical characterization of inhomogeneous thin films is presented. The following...

Approximate methods for the optical characterization of inhomogeneous thin films: Applications to silicon nitride films

Data publikacji: 28 wrz 2019

Zakres stron: 16 - 26

Otrzymano: 19 mar 2019

DOI: https://doi.org/10.2478/jee-2019-0037

Słowa kluczowe
reflectance, ellipsometric parameters, inhomogeneous thin films, optical characterization

© 2019 Ivan Ohlídal et al., published by Sciendo

This work is licensed under the Creative Commons Attribution-NonCommercial-NoDerivatives 4.0 License.

Approximate methods for the optical characterization of inhomogeneous thin films: Applications to silicon nitride films

Data publikacji: 28 wrz 2019

Zakres stron: 16 - 26

Otrzymano: 19 mar 2019

DOI: https://doi.org/10.2478/jee-2019-0037

Słowa kluczowereflectance, ellipsometric parameters, inhomogeneous thin films, optical characterization

© 2019 Ivan Ohlídal et al., published by Sciendo

This work is licensed under the Creative Commons Attribution-NonCommercial-NoDerivatives 4.0 License.

Słowa kluczowe
reflectance, ellipsometric parameters, inhomogeneous thin films, optical characterization