Methods of optimization of reactive sputtering conditions of Al target during AlN films deposition
, oraz
06 sty 2016
O artykule
Data publikacji: 06 sty 2016
Zakres stron: 894 - 901
Otrzymano: 31 maj 2015
Przyjęty: 05 paź 2015
DOI: https://doi.org/10.1515/msp-2015-0116
Słowa kluczowe
© 2015 Rafal Chodun et al., published by De Gruyter Open
This work is licensed under the Creative Commons Attribution-NonCommercial-NoDerivatives 3.0 License.
Chodun, Rafal
Faculty of Materials Science and Engineering, Warsaw University of TechnologyWarsaw, Poland
Nowakowska-Langier, Katarzyna
National Centre for Nuclear Research (NCBJ)Otwock-Swierk, Poland
Zdunek, Krzysztof
Faculty of Materials Science and Engineering, Warsaw University of TechnologyWarsaw, Poland