Methods of optimization of reactive sputtering conditions of Al target during AlN films deposition
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06 ene 2016
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Publicado en línea: 06 ene 2016
Páginas: 894 - 901
Recibido: 31 may 2015
Aceptado: 05 oct 2015
DOI: https://doi.org/10.1515/msp-2015-0116
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© 2015 Rafal Chodun et al., published by De Gruyter Open
This work is licensed under the Creative Commons Attribution-NonCommercial-NoDerivatives 3.0 License.
Chodun, Rafal
Faculty of Materials Science and Engineering, Warsaw University of TechnologyWarsaw, Poland
Nowakowska-Langier, Katarzyna
National Centre for Nuclear Research (NCBJ)Otwock-Swierk, Poland
Zdunek, Krzysztof
Faculty of Materials Science and Engineering, Warsaw University of TechnologyWarsaw, Poland