Methods of optimization of reactive sputtering conditions of Al target during AlN films deposition
, et
06 janv. 2016
À propos de cet article
Publié en ligne: 06 janv. 2016
Pages: 894 - 901
Reçu: 31 mai 2015
Accepté: 05 oct. 2015
DOI: https://doi.org/10.1515/msp-2015-0116
Mots clés
© 2015 Rafal Chodun et al., published by De Gruyter Open
This work is licensed under the Creative Commons Attribution-NonCommercial-NoDerivatives 3.0 License.
Chodun, Rafal
Faculty of Materials Science and Engineering, Warsaw University of TechnologyWarsaw, Poland
Nowakowska-Langier, Katarzyna
National Centre for Nuclear Research (NCBJ)Otwock-Swierk, Poland
Zdunek, Krzysztof
Faculty of Materials Science and Engineering, Warsaw University of TechnologyWarsaw, Poland