<abstract xmlns="http://www.w3.org/1999/xhtml">MoO3 films were deposited by RF magnetron sputtering technique on glass and silicon substrates held at 473 K by sputtering of metallic molybdenum target at an oxygen partial pressure of 4 × 10−2 Pa and at different sputtering pressures in the range of 2 Pa to 6 Pa. The influence of sputtering pressure on the structure and surface morphology, electrical and optical properties of the MoO3 thin films was studied. X-ray diffraction studies suggest that the films deposited at a sputtering pressure of 2 Pa were polycrystalline in nature with mixed phase of α- and β-phase MoO3, while those formed at sputtering pressure of 4 Pa and above were of α-phase MoO3. Scanning electron micrographs showed a decrement in the size of the particles and their shapes changed from needle like structure to dense films with the increase of sputtering pressure. Fourier transform infrared spectroscopic studies confirmed the presence of characteristic vibration modes of Mo=O, Mo–O and Mo–O–Mo related to MoO3. Electrical resistivity of the MoO3 films decreased from 6.0 × 104 Ω cm to 2 × 104 Ω cm with an increase of sputtering pressure from 2 Pa to 6 Pa, respectively. Optical band gap of the films decreased from 3.12 eV to 2.86 eV with the increase of sputtering pressure from 2 Pa to 6 Pa, respectively.</abstract>

MoO3 films were deposited by RF magnetron sputtering technique on glass and silicon substrates held at 473 K by sputtering of metallic molybdenum target at an oxygen partial pressure of 4 × 10−2 Pa and at different sputtering pressures in the range of 2 Pa to 6 Pa. The influence of sputtering pressure on the structure and surface morphology, electrical and optical properties of the MoO3 thin films was studied. X-ray diffraction studies suggest that the films deposited at a sputtering pressure of 2 Pa were polycrystalline in nature with mixed phase of α- and β-phase MoO3, while those formed at sputtering pressure of 4 Pa and above were of α-phase MoO3. Scanning electron micrographs showed a decrement in the size of the particles and their shapes changed from needle like structure to dense films with the increase of sputtering pressure. Fourier transform infrared spectroscopic studies confirmed the presence of characteristic vibration modes of Mo=O, Mo–O and Mo–O–Mo related to MoO3. Electrical resistivity of the MoO3 films decreased from 6.0 × 104 Ω cm to 2 × 104 Ω cm with an increase of sputtering pressure from 2 Pa to 6 Pa, respectively. Optical band gap of the films decreased from 3.12 eV to 2.86 eV with the increase of sputtering pressure from 2 Pa to 6 Pa, respectively.

Sputtering pressure influenced structural, electrical and optical properties of RF magnetron sputtered MoO3 films

Materials Science-Poland

This work is licensed under the Creative Commons Attribution-NonCommercial-NoDerivatives 4.0 License.

Sputtering pressure influenced structural, electrical and optical properties of RF magnetron sputtered MoO films

MoO3 films were deposited by RF magnetron sputtering technique on glass and silicon substrates held at 473 K by sputtering of metallic molybdenum target at an...

Sputtering pressure influenced structural, electrical and optical properties of RF magnetron sputtered MoO₃ films

Publié en ligne: 08 mai 2020

Pages: 41 - 47

Reçu: 17 août 2017

Accepté: 23 avr. 2019

DOI: https://doi.org/10.2478/msp-2020-0001

Mots clés
MoO thin films, RF magnetron sputtering, sputtering pressure, structural properties, optical properties

© 2020 S. Subbarayudu et al., published by Sciendo

This work is licensed under the Creative Commons Attribution-NonCommercial-NoDerivatives 4.0 License.

Sputtering pressure influenced structural, electrical and optical properties of RF magnetron sputtered MoO3 films

Publié en ligne: 08 mai 2020

Pages: 41 - 47

Reçu: 17 août 2017

Accepté: 23 avr. 2019

DOI: https://doi.org/10.2478/msp-2020-0001

Mots clésMoO thin films, RF magnetron sputtering, sputtering pressure, structural properties, optical properties

© 2020 S. Subbarayudu et al., published by Sciendo

This work is licensed under the Creative Commons Attribution-NonCommercial-NoDerivatives 4.0 License.

Sputtering pressure influenced structural, electrical and optical properties of RF magnetron sputtered MoO₃ films

Mots clés
MoO thin films, RF magnetron sputtering, sputtering pressure, structural properties, optical properties