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Properties of aluminium oxide thin films deposited in high effective reactive pulsed magnetron sputtering process

K. Tadaszak

K. Tadaszak

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Tadaszak, K.
, 
K. Nitsch

K. Nitsch

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Nitsch, K.
, 
T. Piasecki

T. Piasecki

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Piasecki, T.
 and 
W. Posadowski

W. Posadowski

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Posadowski, W.
  
Dec 14, 2012
Properties of aluminium oxide thin films deposited in high effective reactive pulsed magnetron sputtering process's Cover Image
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Published Online: Dec 14, 2012
Page range: 323 - 328
DOI: https://doi.org/10.2478/s13536-012-0058-4
Keywords
© 2012 Wroclaw University of Technology
This work is licensed under the Creative Commons Attribution-NonCommercial-NoDerivatives 3.0 License.
Language:
English
Publication timeframe:
4 times per year
Journal Subjects:
Materials Sciences, Materials Sciences, other, Nanomaterials, Functional and Smart Materials, Materials Characterization and Properties
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