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X-ray photoelectron spectroscopy (XPS) study of Heusler alloy (Co2FeAl) interfaced with semiconductor (n-Si) structure

Arvind Kumar

Arvind Kumar

  • Department of Physics, Atma Ram Sanatan Dharma College, University of DelhiNew Delhi, India
  • Department of Physics, Banaras Hindu UniversityVaranasi, India
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Kumar, Arvind
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P.C. Srivastava

P.C. Srivastava

Department of Physics, Banaras Hindu UniversityVaranasi, India
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Srivastava, P.C.
  
Mar 06, 2019
X-ray photoelectron spectroscopy (XPS) study of Heusler alloy (Co2FeAl) interfaced with semiconductor (n-Si) structure's Cover Image
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Published Online: Mar 06, 2019
Page range: 116 - 121
Received: Mar 29, 2018
Accepted: Jul 25, 2018
DOI: https://doi.org/10.2478/msp-2019-0001
Keywords
© 2019 Arvind Kumar et al., published by Sciendo
This work is licensed under the Creative Commons Attribution-NonCommercial-NoDerivatives 4.0 License.
Kumar, Arvind
Department of Physics, Atma Ram Sanatan Dharma College, University of DelhiNew Delhi, India
Department of Physics, Banaras Hindu UniversityVaranasi, India
Srivastava, P.C.
Department of Physics, Banaras Hindu UniversityVaranasi, India
Language:
English
Publication timeframe:
4 times per year
Journal Subjects:
Materials Sciences, Materials Sciences, other, Nanomaterials, Functional and Smart Materials, Materials Characterization and Properties
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