Effect of pulsed magnetron sputtering process for the deposition of thin layers of nickel and nickel oxide
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18 may 2018
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Publicado en línea: 18 may 2018
Páginas: 69 - 74
Recibido: 24 mar 2017
Aceptado: 11 oct 2017
DOI: https://doi.org/10.1515/msp-2017-0092
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© 2018
This work is licensed under the Creative Commons Attribution-NonCommercial-NoDerivatives 4.0 License.
Posadowski, Witold
Faculty of Microsystem Electronics and Photonics,Wroclaw, Poland
Wiatrowski, Artur
Faculty of Microsystem Electronics and Photonics,Wroclaw, Poland
Kapka, Grzegorz
Faculty of Microsystem Electronics and Photonics,Wroclaw, Poland