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Materials Science-Poland
Volume 33 (2015): Issue 3 (September 2015)
Open Access
Structure of AlN films deposited by magnetron sputtering method
K. Nowakowska-Langier
K. Nowakowska-Langier
,
R. Chodun
R. Chodun
,
K. Zdunek
K. Zdunek
,
R. Minikayev
R. Minikayev
and
R. Nietubyc
R. Nietubyc
| Aug 30, 2016
Materials Science-Poland
Volume 33 (2015): Issue 3 (September 2015)
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Published Online:
Aug 30, 2016
Page range:
639 - 643
Received:
Jan 15, 2015
Accepted:
Apr 25, 2015
DOI:
https://doi.org/10.1515/msp-2015-0073
Keywords
AlN films
,
magnetron sputtering method
,
crystalline structure
© 2016
This work is licensed under the Creative Commons Attribution-NonCommercial-NoDerivatives 3.0 License.
K. Nowakowska-Langier
Department of Material Physics, National Centre for Nuclear Research (NCBJ), Andrzeja Soltana 7, 05-400 Otwock-Swierk, Poland
R. Chodun
Faculty of Materials Science and Engineering, Warsaw University of Technology, Woloska 141, 02-507 Warsaw, Poland
K. Zdunek
Faculty of Materials Science and Engineering, Warsaw University of Technology, Woloska 141, 02-507 Warsaw, Poland
R. Minikayev
Institute of Physics, Polish Academy of Sciences, al. Lotnikow 32/46, 02-668, Warsaw, Poland
R. Nietubyc
Department of Material Physics, National Centre for Nuclear Research (NCBJ), Andrzeja Soltana 7, 05-400 Otwock-Swierk, Poland