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Journals
Journal of Electrical Engineering
Volume 67 (2016): Issue 6 (December 2016)
Open Access
Effects of HSQ e–beam Resist Processing on the Fabrication of ICP–RIE Etched TiO
2
Nanostructures
Ivan Hotovy
Ivan Hotovy
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Hotovy, Ivan
,
Ivan Kostic
Ivan Kostic
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Kostic, Ivan
,
Martin Predanocy
Martin Predanocy
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Predanocy, Martin
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Pavol Nemec
Pavol Nemec
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Nemec, Pavol
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Vlastimil Rehacek
Vlastimil Rehacek
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Rehacek, Vlastimil
Dec 30, 2016
Journal of Electrical Engineering
Volume 67 (2016): Issue 6 (December 2016)
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Published Online:
Dec 30, 2016
Page range:
454 - 458
Received:
Jul 07, 2016
DOI:
https://doi.org/10.1515/jee-2016-0067
Keywords
HSQ e-beam resist
,
ICP-RIE etching
,
TiO dots array
© 2016 Faculty of Electrical Engineering and Information Technology, Slovak University of Technology
This work is licensed under the Creative Commons Attribution-NonCommercial-NoDerivatives 3.0 License.
