Effects of HSQ e–beam Resist Processing on the Fabrication of ICP–RIE Etched TiO₂ Nanostructures

Published Online: Dec 30, 2016

Page range: 454 - 458

Received: Jul 07, 2016

DOI: https://doi.org/10.1515/jee-2016-0067

Keywords

HSQ e-beam resist, ICP-RIE etching, TiO dots array

© 2016 Faculty of Electrical Engineering and Information Technology, Slovak University of Technology

This work is licensed under the Creative Commons Attribution-NonCommercial-NoDerivatives 3.0 License.