Accesso libero

Annealing effect on the structural and optoelectronic properties of Cu-Cr-O thin films deposited by reactive magnetron sputtering using a single CuCr target

Du-Cheng Tsai

Du-Cheng Tsai

Department of Materials Science and Engineering, National Chung Hsing UniversityTaiwan, Republic of China
Cerca questo autore su
Sciendo|Google Scholar
Tsai, Du-Cheng
, 
Erh-Chiang Chen

Erh-Chiang Chen

Department of Materials Science and Engineering, National Chung Hsing UniversityTaiwan, Republic of China
Cerca questo autore su
Sciendo|Google Scholar
Chen, Erh-Chiang
, 
Yen-Lin Huang

Yen-Lin Huang

Metal Industries Research and Development CentreTaiwan, Republic of China
Cerca questo autore su
Sciendo|Google Scholar
Huang, Yen-Lin
, 
Fuh-Sheng Shieu

Fuh-Sheng Shieu

Department of Materials Science and Engineering, National Chung Hsing UniversityTaiwan, Republic of China
Cerca questo autore su
Sciendo|Google Scholar
Shieu, Fuh-Sheng
 e 
Zue-Chin Chang

Zue-Chin Chang

Department of Mechanical Engineering, National Chin-Yi University of TechnologyTaiwan, Republic of China
Cerca questo autore su
Sciendo|Google Scholar
Chang, Zue-Chin
  
25 ago 2023
Annealing effect on the structural and optoelectronic properties of Cu-Cr-O thin films deposited by reactive magnetron sputtering using a single CuCr target's Cover Image
INFORMAZIONI SU QUESTO ARTICOLO
Articolo precedente
Articolo Successivo
Cita
Scarica la copertina
Pubblicato online: 25 ago 2023
Pagine: 191 - 201
Ricevuto: 15 mag 2023
Accettato: 13 lug 2023
DOI: https://doi.org/10.2478/msp-2023-0017
Parole chiave
© 2023 Du-Cheng Tsai et al., published by Sciendo
This work is licensed under the Creative Commons Attribution-NonCommercial-NoDerivatives 4.0 International License.

Fig. 1.

XRD patterns of Cu-Cr-O films with different post-annealing temperatures
XRD patterns of Cu-Cr-O films with different post-annealing temperatures

Fig. 2.

The ΔG of reactions 2, 4, and 6 with different annealing temperatures
The ΔG of reactions 2, 4, and 6 with different annealing temperatures

Fig. 3.

Cross-section and plane-view SEM images of Cu-Cr-O films with different post-annealing temperatures: (a) as-deposited, (b) 500°C, (c) 600°C, (d) 700°C, and (e) 800°C
Cross-section and plane-view SEM images of Cu-Cr-O films with different post-annealing temperatures: (a) as-deposited, (b) 500°C, (c) 600°C, (d) 700°C, and (e) 800°C

Fig. 4.

AFM images of Cu-Cr-O films with different post-annealing temperatures: (a) as-deposited, (b) 500°C, (c) 600°C, (d) 700°C, and (e) 800°C
AFM images of Cu-Cr-O films with different post-annealing temperatures: (a) as-deposited, (b) 500°C, (c) 600°C, (d) 700°C, and (e) 800°C

Fig. 5.

TEM images with corresponding SAD patterns (insets) of Cu-Cr-O films with different post-annealing temperatures: (a) 500°C, (b) 600°C, and (c) 800°C
TEM images with corresponding SAD patterns (insets) of Cu-Cr-O films with different post-annealing temperatures: (a) 500°C, (b) 600°C, and (c) 800°C

Fig. 6.

(a) Light transmittance of Cu-Cr-O films with different post-annealing temperatures. (b) variation of (αhv)2 versus hv
(a) Light transmittance of Cu-Cr-O films with different post-annealing temperatures. (b) variation of (αhv)2 versus hv

The elemental composition of Cu-Cr-O films as a function of annealing temperature

Annealing temperature (°C) Cu (at.%) Cr (at.%) O(at.%) Cu/Cr ratio
As-deposited 28.41 14.05 57.54 2.02
500 31.69 15.95 52.36 1.99
600 31.20 16.24 52.55 1.92
700 31.23 15.68 53.09 1.99
800 31.81 15.68 52.51 2.03

The carrier concentration, Hall mobility, and electrical resistivity of Cu-Cr-O films as a function of annealing temperature

Annealing temperature (°C) Carrier concentration (×1017 cm−3) Hall Mobility (cm2/V-s) Electrical resistivity (Ω-cm)
500 2.81 0.121 183
600 4.05 0.373 41
700 3.25 0.223 86
800 0.43 0.268 540
Lingua:
Inglese
Frequenza di pubblicazione:
4 volte all'anno
Argomenti della rivista:
Scienze materiali, Scienze materiali, altro, Nanomateriali, Materiali funzionali ed intelligenti, Caratteristica e proprietà dei materiali
Feed RSS della rivista