Structural and surface analysis of chemical vapor deposited boron doped aluminum nitride thin film on aluminum substrates

Pubblicato online: 18 ott 2019

Pagine: 395 - 403

Ricevuto: 19 apr 2018

Accettato: 23 apr 2019

DOI: https://doi.org/10.2478/msp-2019-0056

Parole chiave

B-AlN, thin film synthesis, CVD, Al substrate structural parameter, surface analysis

© 2019 Shanmugan Subramani et al., published by Sciendo

This work is licensed under the Creative Commons Attribution-NonCommercial-NoDerivatives 3.0 License.