Structural and surface analysis of chemical vapor deposited boron doped aluminum nitride thin film on aluminum substrates

Publicado en línea: 18 oct 2019

Páginas: 395 - 403

Recibido: 19 abr 2018

Aceptado: 23 abr 2019

DOI: https://doi.org/10.2478/msp-2019-0056

Palabras clave

B-AlN, thin film synthesis, CVD, Al substrate structural parameter, surface analysis

© 2019 Shanmugan Subramani et al., published by Sciendo

This work is licensed under the Creative Commons Attribution-NonCommercial-NoDerivatives 3.0 License.