Accesso libero

Controlled fluoridation of amorphous carbon films deposited at reactive plasma conditions

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Cita

Alexander Yoffe
Weizmann Institute of Science, Rehovot, Israel 2Tel Aviv University, Tel Aviv, Israel
Ilya Zon
Weizmann Institute of Science, Rehovot, Israel
Yishay Feldman
Weizmann Institute of Science, Rehovot, Israel
Victor Shelukhin
Tel Aviv University, Tel Aviv, Israel
eISSN:
2083-134X
Lingua:
Inglese
Frequenza di pubblicazione:
4 volte all'anno
Argomenti della rivista:
Materials Sciences, other, Nanomaterials, Functional and Smart Materials, Materials Characterization and Properties