Influence of modulation frequency on the synthesis of thin films in pulsed magnetron sputtering processes

Publicado en línea: 01 feb 2019

Páginas: 697 - 703

Recibido: 29 nov 2017

Aceptado: 16 jul 2018

DOI: https://doi.org/10.2478/msp-2018-0078

Palabras clave

pulsed magnetron sputtering, pulse plasma, modulation frequency, metallic films, ceramic films

© 2018 G.W. Strzelecki et al., published by Sciendo

This work is licensed under the Creative Commons Attribution-NonCommercial-NoDerivatives 4.0 License.