Influence of modulation frequency on the synthesis of thin films in pulsed magnetron sputtering processes
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01 feb 2019
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Publicado en línea: 01 feb 2019
Páginas: 697 - 703
Recibido: 29 nov 2017
Aceptado: 16 jul 2018
DOI: https://doi.org/10.2478/msp-2018-0078
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© 2018 G.W. Strzelecki et al., published by Sciendo
This work is licensed under the Creative Commons Attribution-NonCommercial-NoDerivatives 4.0 License.
Strzelecki, G.W.
National Centre for Nuclear ResearchOtwock, Poland
Nowakowska-Langier, K.
National Centre for Nuclear ResearchOtwock, Poland
Chodun, R.
Faculty of Materials Science and Engineering, Warsaw University of TechnologyWarsaw, Poland
Okrasa, S.
Faculty of Materials Science and Engineering, Warsaw University of TechnologyWarsaw, Poland
Wicher, B.
Faculty of Materials Science and Engineering, Warsaw University of TechnologyWarsaw, Poland
Zdunek, K.
Faculty of Materials Science and Engineering, Warsaw University of TechnologyWarsaw, Poland