Login
Register
Reset Password
Publish & Distribute
Publishing Solutions
Distribution Solutions
Subjects
Architecture and Design
Arts
Business and Economics
Chemistry
Classical and Ancient Near Eastern Studies
Computer Sciences
Cultural Studies
Engineering
General Interest
Geosciences
History
Industrial Chemistry
Jewish Studies
Law
Library and Information Science, Book Studies
Life Sciences
Linguistics and Semiotics
Literary Studies
Materials Sciences
Mathematics
Medicine
Music
Pharmacy
Philosophy
Physics
Social Sciences
Sports and Recreation
Theology and Religion
Publications
Journals
Books
Proceedings
Publishers
Blog
Contact
Search
EUR
USD
GBP
English
English
Deutsch
Polski
Español
Français
Italiano
Cart
Home
Journals
Journal of Electrical Engineering
Volume 65 (2014): Issue 6 (November 2014)
Open Access
Electron Beam Lithography Double Step Exposure Technique for Fabrication of Mushroom-Like Profile in Bilayer Resist System
Indykiewicz Kornelia
Indykiewicz Kornelia
,
Paszkiewicz Bogdan
Paszkiewicz Bogdan
,
Szymański Tomasz
Szymański Tomasz
and
Paszkiewicz Regina
Paszkiewicz Regina
| Jan 31, 2015
Journal of Electrical Engineering
Volume 65 (2014): Issue 6 (November 2014)
About this article
Previous Article
Next Article
Abstract
References
Authors
Articles in this Issue
Preview
PDF
Cite
Share
Published Online:
Jan 31, 2015
Page range:
381 - 385
Received:
Jun 15, 2014
DOI:
https://doi.org/10.2478/jee-2014-0062
© 2015 Faculty of Electrical Engineering and Information Technology, Slovak University of Technology
This work is licensed under the Creative Commons Attribution-NonCommercial-NoDerivatives 3.0 License.
Indykiewicz Kornelia
Paszkiewicz Bogdan
Szymański Tomasz
Paszkiewicz Regina
Faculty of Microsystem Electronics and Photonics, Wroclaw University of Technology, 27 Wybrzeze Wyspiańskiego Str., 50-370 Wroclaw, Poland