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Journals
Materials Science-Poland
Volume 33 (2015): Issue 4 (December 2015)
Open Access
Properties of AlN thin films deposited by means of magnetron sputtering for ISFET applications
Piotr Firek
Piotr Firek
,
Michał Wáskiewicz
Michał Wáskiewicz
,
Bartłomiej Stonio
Bartłomiej Stonio
and
Jan Szmidt
Jan Szmidt
| Jan 06, 2016
Materials Science-Poland
Volume 33 (2015): Issue 4 (December 2015)
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Published Online:
Jan 06, 2016
Page range:
669 - 676
Received:
Jan 13, 2014
Accepted:
Jun 16, 2015
DOI:
https://doi.org/10.1515/msp-2015-0095
Keywords
ISFET/MISFET technology
,
AlN
,
aluminum nitride
,
magnetron sputtering
© 2015 Piotr Firek et al., published by De Gruyter Open
This work is licensed under the Creative Commons Attribution-NonCommercial-NoDerivatives 3.0 License.