Annealing effect on the structural and optoelectronic properties of Cu-Cr-O thin films deposited by reactive magnetron sputtering using a single CuCr target
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25 sie 2023
O artykule
Data publikacji: 25 sie 2023
Zakres stron: 191 - 201
Otrzymano: 15 maj 2023
Przyjęty: 13 lip 2023
DOI: https://doi.org/10.2478/msp-2023-0017
Słowa kluczowe
© 2023 Du-Cheng Tsai et al., published by Sciendo
This work is licensed under the Creative Commons Attribution-NonCommercial-NoDerivatives 4.0 International License.
Tsai, Du-Cheng
Department of Materials Science and Engineering, National Chung Hsing UniversityTaiwan, Republic of China
Chen, Erh-Chiang
Department of Materials Science and Engineering, National Chung Hsing UniversityTaiwan, Republic of China
Huang, Yen-Lin
Metal Industries Research and Development CentreTaiwan, Republic of China
Shieu, Fuh-Sheng
Department of Materials Science and Engineering, National Chung Hsing UniversityTaiwan, Republic of China
Chang, Zue-Chin
Department of Mechanical Engineering, National Chin-Yi University of TechnologyTaiwan, Republic of China