Annealing effect on the structural and optoelectronic properties of Cu-Cr-O thin films deposited by reactive magnetron sputtering using a single CuCr target
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25 août 2023
À propos de cet article
Publié en ligne: 25 août 2023
Pages: 191 - 201
Reçu: 15 mai 2023
Accepté: 13 juil. 2023
DOI: https://doi.org/10.2478/msp-2023-0017
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© 2023 Du-Cheng Tsai et al., published by Sciendo
This work is licensed under the Creative Commons Attribution-NonCommercial-NoDerivatives 4.0 International License.
Tsai, Du-Cheng
Department of Materials Science and Engineering, National Chung Hsing UniversityTaiwan, Republic of China
Chen, Erh-Chiang
Department of Materials Science and Engineering, National Chung Hsing UniversityTaiwan, Republic of China
Huang, Yen-Lin
Metal Industries Research and Development CentreTaiwan, Republic of China
Shieu, Fuh-Sheng
Department of Materials Science and Engineering, National Chung Hsing UniversityTaiwan, Republic of China
Chang, Zue-Chin
Department of Mechanical Engineering, National Chin-Yi University of TechnologyTaiwan, Republic of China