<abstract xmlns="http://www.w3.org/1999/xhtml">In this study, thin Al2O3 films (11 nm – 82 nm) were deposited by means of a recently developed pulse gas injection magnetron sputtering method and investigated by means of atomic force microscopy, spectroscopic ellipsometry and spectrophotometry. Quite low values of optical constants (1.581 to 1.648 at λ = 550 nm) of the alumina films are directly associated with specific growth conditions (pulse injection of the reactive or reactive + inert gas) in the pulse gas injection magnetron sputtering process. The light transmittance of Al2O3/glass systems (86 % to 90 %) is only a few percent lower than that calculated for glass (93 %).</abstract>

In this study, thin Al2O3 films (11 nm – 82 nm) were deposited by means of a recently developed pulse gas injection magnetron sputtering method and investigated by means of atomic force microscopy, spectroscopic ellipsometry and spectrophotometry. Quite low values of optical constants (1.581 to 1.648 at λ = 550 nm) of the alumina films are directly associated with specific growth conditions (pulse injection of the reactive or reactive + inert gas) in the pulse gas injection magnetron sputtering process. The light transmittance of Al2O3/glass systems (86 % to 90 %) is only a few percent lower than that calculated for glass (93 %).

Optical characterization of thin Al2O3 layers deposited by magnetron sputtering technique at industrial conditions for applications in glazing

Materials Science-Poland

This work is licensed under the Creative Commons Attribution-NonCommercial-NoDerivatives 4.0 License.

Optical characterization of thin AlO layers deposited by magnetron sputtering technique at industrial conditions for applications in glazing

In this study, thin Al2O3 films (11 nm – 82 nm) were deposited by means of a recently developed pulse gas injection magnetron sputtering method and...

Optical characterization of thin Al₂O₃ layers deposited by magnetron sputtering technique at industrial conditions for applications in glazing

Data publikacji: 08 maj 2020

Zakres stron: 108 - 115

Otrzymano: 18 sie 2018

Przyjęty: 19 lut 2019

DOI: https://doi.org/10.2478/msp-2019-0093

Słowa kluczowe
AlO, GIMS, refractive index, light transmittance, glazing

© 2020 Piotr Dywel et al., published by Sciendo

This work is licensed under the Creative Commons Attribution-NonCommercial-NoDerivatives 4.0 License.

Optical characterization of thin Al2O3 layers deposited by magnetron sputtering technique at industrial conditions for applications in glazing

Data publikacji: 08 maj 2020

Zakres stron: 108 - 115

Otrzymano: 18 sie 2018

Przyjęty: 19 lut 2019

DOI: https://doi.org/10.2478/msp-2019-0093

Słowa kluczoweAlO, GIMS, refractive index, light transmittance, glazing

© 2020 Piotr Dywel et al., published by Sciendo

This work is licensed under the Creative Commons Attribution-NonCommercial-NoDerivatives 4.0 License.

Optical characterization of thin Al₂O₃ layers deposited by magnetron sputtering technique at industrial conditions for applications in glazing

Słowa kluczowe
AlO, GIMS, refractive index, light transmittance, glazing