<abstract xmlns="http://www.w3.org/1999/xhtml"><p>The presented experiments and studies are intended for photovoltaic applications of crystalline silicon. This work deals with chemical treatment of the surface of n-type silicon wafers with different resistivity to reduce their reflectivity. Chemical surface treatment of silicon is an alternative method to using the antireflection layer. Optical losses caused by the reflection of light from the surface of the solar cells significantly reduce their efficiency. The investigated samples were prepared by the electrochemical etching method in the solution based on hydrofluoric acid and ethanol. The analysis of the prepared samples is divided into two parts, namely experimental measurements, and theoretical modeling. Experimental measurements are performed using UV-VIS spectroscopy, spectroscopic ellipsometry and SEM microscopy. Theoretical modeling is based on the construction and optimization of theoretical model of optical response (reflectivity and ellipsometric parameters) to determine the effective refractive index and thickness of formed structure. Effective refractive index of studied samples in theoretical model of optical response is based on Looyenga effective medium approximation and Tauc-Lorentz dispersion model.</p></abstract>

The presented experiments and studies are intended for photovoltaic applications of crystalline silicon. This work deals with chemical treatment of the surface of n-type silicon wafers with different resistivity to reduce their reflectivity. Chemical surface treatment of silicon is an alternative method to using the antireflection layer. Optical losses caused by the reflection of light from the surface of the solar cells significantly reduce their efficiency. The investigated samples were prepared by the electrochemical etching method in the solution based on hydrofluoric acid and ethanol. The analysis of the prepared samples is divided into two parts, namely experimental measurements, and theoretical modeling. Experimental measurements are performed using UV-VIS spectroscopy, spectroscopic ellipsometry and SEM microscopy. Theoretical modeling is based on the construction and optimization of theoretical model of optical response (reflectivity and ellipsometric parameters) to determine the effective refractive index and thickness of formed structure. Effective refractive index of studied samples in theoretical model of optical response is based on Looyenga effective medium approximation and Tauc-Lorentz dispersion model.

Optical properties of electrochemically etched N-type silicon wafers for solar cell applications

Faculty of Electrical Engineering and Information Technology

Physics Department, Faculty of Electrical Engineering and Information Technology

Journal of Electrical Engineering

This work is licensed under the Creative Commons Attribution-NonCommercial-NoDerivatives 4.0 International License.

The presented experiments and studies are intended for photovoltaic applications of crystalline silicon. This work deals with chemical treatment of the surface...

Optical properties of electrochemically etched N-type silicon wafers for solar cell applications

Data publikacji: 24 gru 2020

Zakres stron: 406 - 412

Otrzymano: 02 lip 2020

DOI: https://doi.org/10.2478/jee-2020-0055

Słowa kluczowe
electrochemical etching, effective medium approximation, Looyenga EMA, modified Fresnel coefficients, reflectivity, Tauc-Lorentz dispersion model

© 2020 Martin Králik et al., published by Sciendo

This work is licensed under the Creative Commons Attribution-NonCommercial-NoDerivatives 4.0 International License.

Optical properties of electrochemically etched N-type silicon wafers for solar cell applications

Data publikacji: 24 gru 2020

Zakres stron: 406 - 412

Otrzymano: 02 lip 2020

DOI: https://doi.org/10.2478/jee-2020-0055

Słowa kluczoweelectrochemical etching, effective medium approximation, Looyenga EMA, modified Fresnel coefficients, reflectivity, Tauc-Lorentz dispersion model

© 2020 Martin Králik et al., published by Sciendo

This work is licensed under the Creative Commons Attribution-NonCommercial-NoDerivatives 4.0 International License.

Słowa kluczowe
electrochemical etching, effective medium approximation, Looyenga EMA, modified Fresnel coefficients, reflectivity, Tauc-Lorentz dispersion model