1) Wavelength (λ) |
1.3 μm |
2) Separation between the electrodes (d) |
6 μm |
3) Refractive index of the substrate material (n) |
1.47 |
4) Electro-optic coefficients (r) |
3.66 × 10−10 m/v |
5) Length of the EO material (L) |
10,000 μm |
6) Cladding dielectric material refractive index |
1 |
7) Cladding thickness |
2 μm |
8) Lateral Ti diffusion length |
3.5 μm |
9) Ti-diffusion length in depth |
4.2 μm |
10) Length of the device |
33 mm |
11) Width of the devices |
100 μm |
12) Substrate material and thickness |
Lithium Niobate, 10 μm |
13) The Refractive index of the buffer layer |
1.47 |
14) The horizontal and vertical permittivity of the buffer layer |
4 |
15) Thickness of the buffer layer |
0.3 μm |
16) The thickness of the developed electrode on the buffer layer |
4 μm |
17) Width of the first, second, and third electrodes |
50 μm, 26 μm, and 50 μm |
18) Gap between electrodes 1 and 2 |
6 μm |
19) Gap between electrodes 2 and 3 |
6 μm |
20) Spatial overlap Γ |
1 |