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Study on the suitability of ZnO thin film for dynamic pressure sensing application

Suma M. N.

Suma M. N.

ISROBangalore, India
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M. N., Suma
, 
Venkateswarlu Gaddam

Venkateswarlu Gaddam

Indian Institute of ScienceBangalore, India
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Gaddam, Venkateswarlu
, 
M. V. N. Prasad

M. V. N. Prasad

ISROBangalore, India
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Prasad, M. V. N.
, 
M. M. Nayak

M. M. Nayak

Indian Institute of ScienceBangalore, India
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Nayak, M. M.
 oraz 
K. Rajanna

K. Rajanna

Indian Institute of ScienceBangalore, India
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Rajanna, K.
  
29 sty 2020
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Kategoria artykułu: Research-Article
Data publikacji: 29 sty 2020
Zakres stron: 1 - 9
Otrzymano: 17 gru 2018
DOI: https://doi.org/10.21307/ijssis-2020-002
Słowa kluczowe
© 2020 Suma M. N. et al., published by Sciendo
This work is licensed under the Creative Commons Attribution-NonCommercial-NoDerivatives 4.0 International License.

Figure 1:

Schematic of ZnO thin film-based sensor packaged for dynamic pressure sensing application.
Schematic of ZnO thin film-based sensor packaged for dynamic pressure sensing application.

Figure 2:

Experimental test setup used for the characterization of dynamic pressure sensor.
Experimental test setup used for the characterization of dynamic pressure sensor.

Figure 3:

XRD pattern of ZnO thin film deposited for different durations.
XRD pattern of ZnO thin film deposited for different durations.

Figure 4:

FE-SEM image: surface morphology of the ZnO thin films for deposition durations of (A) 15 min, (B) 30 min, (C) 45 min, and (D) 60 min.
FE-SEM image: surface morphology of the ZnO thin films for deposition durations of (A) 15 min, (B) 30 min, (C) 45 min, and (D) 60 min.

Figure 5:

FE-SEM image: cross-section of the ZnO thin films for deposition durations of (A) 15 min, (B) 30 min, (C) 45 min, and (D) 60 min.
FE-SEM image: cross-section of the ZnO thin films for deposition durations of (A) 15 min, (B) 30 min, (C) 45 min, and (D) 60 min.

Figure 6:

Variation of film thickness with deposition duration.
Variation of film thickness with deposition duration.

Figure 7:

EDS spectra of the thin films for the deposition durations of (A) 15 min, (B) 30 min, (C) 45 min, and (D) 60 min.
EDS spectra of the thin films for the deposition durations of (A) 15 min, (B) 30 min, (C) 45 min, and (D) 60 min.

Figure 8:

(A) EDS result – composition of ZnO film in weight %, and (B) EDS result – composition of ZnO film in atomic %.
(A) EDS result – composition of ZnO film in weight %, and (B) EDS result – composition of ZnO film in atomic %.

Figure 9:

Response of ZnO thin film sensor (Sensor 4) and reference sensor to shockwave (14.24 bar pressure).
Response of ZnO thin film sensor (Sensor 4) and reference sensor to shockwave (14.24 bar pressure).

Figure 10:

Output of ZnO thin film sensors vs shockwave pressure.
Output of ZnO thin film sensors vs shockwave pressure.

Figure 11:

Sensitivity of ZnO thin film dynamic pressure sensors.
Sensitivity of ZnO thin film dynamic pressure sensors.

Structural details of ZnO thin film derived from XRD_

Sl. No. Deposition duration (min) 2θ (Deg) FWHM (Deg) Average grain size (nm)
1 15 33.950 0.796 10.905
2 30 33.890 0.684 12.694
3 45 33.890 0.601 14.435
4 60 34.014 0.517 16.777

Sputtering parameters used for deposition of ZnO thin film_

Target – substrate distance 28 cm
Substrate temperature 24 ± 2oC
RF power 120 W
Ar-O2 ratio 17.1–3.1 Sccm (85%–15%)
Ultimate pressure 5 × 10−6 mbar
Working pressure 1.4 × 10−2 mbar
Deposition time 15, 30, 45, and 60 min
Język:
Angielski
Częstotliwość wydawania:
1 razy w roku
Dziedziny czasopisma:
Inżynieria, Wstępy i przeglądy, Inżynieria, inne
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