<abstract xmlns="http://www.w3.org/1999/xhtml">

<p>ZnO thin films were prepared by RF reactive magnetron sputtering on phynox substrate at room temperature for four different thicknesses by varying deposition duration. The structural and morphological properties and composition of these films were characterized using XRD, SEM, and EDS, respectively. Suitability of these films for dynamic pressure sensing applications and the effect of film thickness on dynamic pressure sensing were evaluated experimentally using a shock tube equipment. Shock tube test results show the pure dynamic behavior of ZnO films with fast rise and discharge. Sensors with higher film thickness showed improved sensitivity which is on par with commercially available dynamic pressure sensors. This work demonstrates that the cost-effective sensors based on ZnO thin film are capable of sensing dynamic pressures for different pressure ranges.</p>
</abstract>

ZnO thin films were prepared by RF reactive magnetron sputtering on phynox substrate at room temperature for four different thicknesses by varying deposition duration. The structural and morphological properties and composition of these films were characterized using XRD, SEM, and EDS, respectively. Suitability of these films for dynamic pressure sensing applications and the effect of film thickness on dynamic pressure sensing were evaluated experimentally using a shock tube equipment. Shock tube test results show the pure dynamic behavior of ZnO films with fast rise and discharge. Sensors with higher film thickness showed improved sensitivity which is on par with commercially available dynamic pressure sensors. This work demonstrates that the cost-effective sensors based on ZnO thin film are capable of sensing dynamic pressures for different pressure ranges.

Study on the suitability of ZnO thin film for dynamic pressure sensing application

International Journal on Smart Sensing and Intelligent Systems

This work is licensed under the Creative Commons Attribution-NonCommercial-NoDerivatives 4.0 International License.

running-head

ZnO thin films were prepared by RF reactive magnetron sputtering on phynox substrate at room temperature for four different thicknesses by varying deposition...

Sl. No.	Deposition duration (min)	2θ (Deg)	FWHM (Deg)	Average grain size (nm)
1	15	33.950	0.796	10.905
2	30	33.890	0.684	12.694
3	45	33.890	0.601	14.435
4	60	34.014	0.517	16.777

Target – substrate distance	28 cm
Substrate temperature	24 ± 2^oC
RF power	120 W
Ar-O₂ ratio	17.1–3.1 Sccm (85%–15%)
Ultimate pressure	5 × 10⁻⁶ mbar
Working pressure	1.4 × 10⁻² mbar
Deposition time	15, 30, 45, and 60 min

Study on the suitability of ZnO thin film for dynamic pressure sensing application

Article Category: Research-Article

Data publikacji: 29 sty 2020

Zakres stron: 1 - 9

Otrzymano: 17 gru 2018

DOI: https://doi.org/10.21307/ijssis-2020-002

Słowa kluczowe
ZnO, Thin film, Sputtering, Dynamic pressure sensor, Shock tube.

© 2020 Suma M. N. et al., published by Sciendo

This work is licensed under the Creative Commons Attribution-NonCommercial-NoDerivatives 4.0 International License.

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Structural details of ZnO thin film derived from XRD.

Sputtering parameters used for deposition of ZnO thin film.

Study on the suitability of ZnO thin film for dynamic pressure sensing application

Article Category: Research-Article

Data publikacji: 29 sty 2020

Zakres stron: 1 - 9

Otrzymano: 17 gru 2018

DOI: https://doi.org/10.21307/ijssis-2020-002

Słowa kluczoweZnO, Thin film, Sputtering, Dynamic pressure sensor, Shock tube.

© 2020 Suma M. N. et al., published by Sciendo

This work is licensed under the Creative Commons Attribution-NonCommercial-NoDerivatives 4.0 International License.

Figure 1:

Figure 2:

Figure 3:

Figure 4:

Figure 5:

Figure 6:

Figure 7:

Figure 8:

Figure 9:

Figure 10:

Figure 11:

Structural details of ZnO thin film derived from XRD.

Sputtering parameters used for deposition of ZnO thin film.

Słowa kluczowe
ZnO, Thin film, Sputtering, Dynamic pressure sensor, Shock tube.