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SEM images and XRD patterns of the samples: (a) surface of the oxide layer before EBI; (b) and (c) surfaces of the SiO2 film after EBI; (d) XRD patterns of the oxide layers before and after EBI.SIMS profile of boron concentration.SEM images of silicon wafer surface: (a) surface of the silicon wafer before EBI; (b, d) and (c, e) surfaces of the silicon wafer after EBI for 1 h.SIMS profile of silicon wafer without oxide layer.