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The application of magnetic self-filter to optimization of AIN film growth process during the impulse plasma deposition synthesis


Zacytuj

Fig. 1

Schematic diagram of the apparatus used in the experiment (A), wiring diagram of the coil connected with plasma accelerator (B) and photograph of the coil coupled with accelerator installed in the vacuum chamber.
Schematic diagram of the apparatus used in the experiment (A), wiring diagram of the coil connected with plasma accelerator (B) and photograph of the coil coupled with accelerator installed in the vacuum chamber.

Fig. 2

Photograph of full single plasma pack guided by the bent down coil of filter.
Photograph of full single plasma pack guided by the bent down coil of filter.

Fig. 3

Comparison of optical spectrum of magnetically filtered impulse plasma (red) with optical spectrum of plasma generated at standard apparatus of IPD method (blue).
Comparison of optical spectrum of magnetically filtered impulse plasma (red) with optical spectrum of plasma generated at standard apparatus of IPD method (blue).

Fig. 4

Raman spectra of AlN films deposited on silicon substrates during the experiment with magnetic filtering (top) and without filtering (bottom).
Raman spectra of AlN films deposited on silicon substrates during the experiment with magnetic filtering (top) and without filtering (bottom).

Fig. 5

Surface images of AlN films deposited by a standard apparatus (A) and by the apparatus with the filter coupled with accelerator.
Surface images of AlN films deposited by a standard apparatus (A) and by the apparatus with the filter coupled with accelerator.

Fig. 6

SEM photographs of AlN films structures deposited during the processes with the standard accelerator (left column) and using a plasma filtering (right column).
SEM photographs of AlN films structures deposited during the processes with the standard accelerator (left column) and using a plasma filtering (right column).
eISSN:
2083-134X
Język:
Angielski
Częstotliwość wydawania:
4 razy w roku
Dziedziny czasopisma:
Materials Sciences, other, Nanomaterials, Functional and Smart Materials, Materials Characterization and Properties