<abstract xmlns="http://www.w3.org/1999/xhtml"><p>We have optimized the deposition of the highly electrically resistive undoped (intrinsic) polycrystalline ZnO thin layers on fused silica substrates by the DC reactive magnetron sputtering of metallic zinc target in argonne/oxide atmosphere and we introduced the post-deposition hydrogen plasma doping. The thickness of thin film was evaluated by reflectance interferometry using the metallographic optical microscope fiber coupled to the CCD spectrometer operating in 400-1000 nm spectral range. The optical absorption was measured by photothermal deflection spectroscopy operating in 300-1600 nm spectral range. The change of the optical absorption edge and the increase of the infrared optical absorption was detected in hydrogenated ZnO. The increase of the infrared optical absorption goes with the increase of the electrical conductivity. We conclude that the plasma hydrogenation of the intrinsic ZnO thin films is related to increase of the free carrier concentration.</p></abstract>

We have optimized the deposition of the highly electrically resistive undoped (intrinsic) polycrystalline ZnO thin layers on fused silica substrates by the DC reactive magnetron sputtering of metallic zinc target in argonne/oxide atmosphere and we introduced the post-deposition hydrogen plasma doping. The thickness of thin film was evaluated by reflectance interferometry using the metallographic optical microscope fiber coupled to the CCD spectrometer operating in 400-1000 nm spectral range. The optical absorption was measured by photothermal deflection spectroscopy operating in 300-1600 nm spectral range. The change of the optical absorption edge and the increase of the infrared optical absorption was detected in hydrogenated ZnO. The increase of the infrared optical absorption goes with the increase of the electrical conductivity. We conclude that the plasma hydrogenation of the intrinsic ZnO thin films is related to increase of the free carrier concentration.

Optical properties of the plasma hydrogenated ZnO thin films

Faculty of Biomedical Engineering CTU in Prague

Journal of Electrical Engineering

This work is licensed under the Creative Commons Attribution-NonCommercial-NoDerivatives 4.0 License.

{"article-title":"Optical properties of the plasma hydrogenated ZnO thin films"}

We have optimized the deposition of the highly electrically resistive undoped (intrinsic) polycrystalline ZnO thin layers on fused silica substrates by the DC...

Optical properties of the plasma hydrogenated ZnO thin films

Data publikacji: 29 gru 2017

Zakres stron: 70 - 73

Otrzymano: 23 kwi 2017

DOI: https://doi.org/10.1515/jee-2017-0060

Słowa kluczowe
metal oxide, magnetron sputtering, thin films, reflectance interferometry, photothermal deflection spectroscopy

© 2017 Yu-Ying Chang et al., published by De Gruyter Open

This work is licensed under the Creative Commons Attribution-NonCommercial-NoDerivatives 4.0 License.

Optical properties of the plasma hydrogenated ZnO thin films

Data publikacji: 29 gru 2017

Zakres stron: 70 - 73

Otrzymano: 23 kwi 2017

DOI: https://doi.org/10.1515/jee-2017-0060

Słowa kluczowemetal oxide, magnetron sputtering, thin films, reflectance interferometry, photothermal deflection spectroscopy

© 2017 Yu-Ying Chang et al., published by De Gruyter Open

This work is licensed under the Creative Commons Attribution-NonCommercial-NoDerivatives 4.0 License.

Słowa kluczowe
metal oxide, magnetron sputtering, thin films, reflectance interferometry, photothermal deflection spectroscopy