<abstract xmlns="http://www.w3.org/1999/xhtml">The purpose of this work is the study of the correlation between the thickness of tantalum pentoxide thin films and their three-dimensional (3D) micromorphology. The samples were prepared on silicon substrates by electron beam evaporation. The differences in surface structure of the processed and reference samples were investigated. Compositional studies were performed by energy-dispersive X-ray spectroscopy. Stereometric analysis was carried out on the basis of atomic force microscopy (AFM) data, for tantalum pentoxide samples with 20 nm, 40 nm, 60 nm, 80 nm and 100 nm thicknesses. These methods are frequently used in describing experimental data of surface nanomorphology of Ta2O5. The results can be used to validate theoretical models for prediction or correlation of nanotexture surface parameters.</abstract>

The purpose of this work is the study of the correlation between the thickness of tantalum pentoxide thin films and their three-dimensional (3D) micromorphology. The samples were prepared on silicon substrates by electron beam evaporation. The differences in surface structure of the processed and reference samples were investigated. Compositional studies were performed by energy-dispersive X-ray spectroscopy. Stereometric analysis was carried out on the basis of atomic force microscopy (AFM) data, for tantalum pentoxide samples with 20 nm, 40 nm, 60 nm, 80 nm and 100 nm thicknesses. These methods are frequently used in describing experimental data of surface nanomorphology of Ta2O5. The results can be used to validate theoretical models for prediction or correlation of nanotexture surface parameters.

Stereometric analysis of Ta2O5 thin films

Faculty of Electrical Engineering and Communication, Physics Department

The Directorate of Research, Development and Innovation Management (DMCDI)

Materials Science-Poland

This work is licensed under the Creative Commons Attribution-NonCommercial-NoDerivatives 4.0 License.

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The purpose of this work is the study of the correlation between the thickness of tantalum pentoxide thin films and their three-dimensional (3D)...

Stereometric analysis of Ta₂O₅ thin films

Pubblicato online: 10 gen 2020

Pagine: -

Ricevuto: 04 ott 2018

Accettato: 23 apr 2019

DOI: https://doi.org/10.2478/msp-2019-0083

Parole chiave
atomic force microscopy, stereometric analysis, TaO, topography

© 2019 Dinara Sobola et al., published by Sciendo

This work is licensed under the Creative Commons Attribution-NonCommercial-NoDerivatives 4.0 License.

Stereometric analysis of Ta2O5 thin films

Pubblicato online: 10 gen 2020

Pagine: -

Ricevuto: 04 ott 2018

Accettato: 23 apr 2019

DOI: https://doi.org/10.2478/msp-2019-0083

Parole chiaveatomic force microscopy, stereometric analysis, TaO, topography

© 2019 Dinara Sobola et al., published by Sciendo

This work is licensed under the Creative Commons Attribution-NonCommercial-NoDerivatives 4.0 License.

Stereometric analysis of Ta₂O₅ thin films

Parole chiave
atomic force microscopy, stereometric analysis, TaO, topography