Macroscopic Thin Film Deposition Model for the Two-Reactive-Gas Sputtering Process
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09 set 2017
INFORMAZIONI SU QUESTO ARTICOLO
Pubblicato online: 09 set 2017
Pagine: 62 - 78
Ricevuto: 15 feb 2017
DOI: https://doi.org/10.1515/auseme-2017-0005
Parole chiave
© 2016 András Kelemen et al., published by De Gruyter Open
This work is licensed under the Creative Commons Attribution-NonCommercial-NoDerivatives 3.0 License.
Kelemen, András
Department of Electrical Engineering, Faculty of Technical and Human Sciences, Sapientia Hungarian University of TransylvaniaTg. Mureş
Biró, Domokos
Department of Mechanical Engineering, Faculty of Technical and Human Sciences, Sapientia Hungarian University of TransylvaniaTg. Mureş
Fekete, Albert-Zsombor
Department of Electrical Engineering, Faculty of Technical and Human Sciences, Sapientia Hungarian University of TransylvaniaTg. Mureş
Jakab-Farkas, László
Department of Electrical Engineering, Faculty of Technical and Human Sciences, Sapientia Hungarian University of TransylvaniaTg. Mureş
Madarász, Róbert Rossi
Department of Electrical Engineering, Faculty of Technical and Human Sciences, Sapientia Hungarian University of TransylvaniaTg. Mureş