Reactive Magnetron Sputtering Control Based on an Analytical Condition of Stoichiometry
et
| 25 déc. 2023
Publié en ligne: 25 déc. 2023
Pages: 74 - 85
Reçu: 15 juin 2023
© 2023 Róbert Rossi Madarász et al., published by Sciendo
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