<abstract xmlns="http://www.w3.org/1999/xhtml"><p>Nanofluidic devices with two-dimensional nanochannels have many applications in biology and chemistry, however, it is still a challenge to develop a low-cost and simple method for fabricating nano-masks that can be used to produce two-dimensional nanochannels. In this paper, a novel low-cost and simple method, based on UV lithography and oxygen plasma, was proposed to fabricate nano-mask. The influence of exposure time on the photoresist mesas was investigated in the ultraviolet lithography process. The parameters of RF power and treatment time on the width reduction of photoresist mesas were analyzed by the oxygen plasma. In our work, in order to increase the efficiency controllability of photoresist removal, a RF power of 90 W, a pressure of oxygen plasma 60 Pa, and the time division method were adopted to remove photoresist by oxygen plasma. Finally, nano-patterns of photoresist mesas with bottom width of 330 nm were successfully fabricated. The proposed method provides a low-cost way to produce high-throughput two-dimensional nanochannels.</p></abstract>

Nanofluidic devices with two-dimensional nanochannels have many applications in biology and chemistry, however, it is still a challenge to develop a low-cost and simple method for fabricating nano-masks that can be used to produce two-dimensional nanochannels. In this paper, a novel low-cost and simple method, based on UV lithography and oxygen plasma, was proposed to fabricate nano-mask. The influence of exposure time on the photoresist mesas was investigated in the ultraviolet lithography process. The parameters of RF power and treatment time on the width reduction of photoresist mesas were analyzed by the oxygen plasma. In our work, in order to increase the efficiency controllability of photoresist removal, a RF power of 90 W, a pressure of oxygen plasma 60 Pa, and the time division method were adopted to remove photoresist by oxygen plasma. Finally, nano-patterns of photoresist mesas with bottom width of 330 nm were successfully fabricated. The proposed method provides a low-cost way to produce high-throughput two-dimensional nanochannels.

Fabrication of nano-patterns of photoresist by ultraviolet lithography and oxygen plasma

Tianjin University of Science and Technology

Key Laboratory for Micro/Nano Technology and Systems of Liaoning Province

Journal of Electrical Engineering

This work is licensed under the Creative Commons Attribution-NonCommercial-NoDerivatives 3.0 License.

Nanofluidic devices with two-dimensional nanochannels have many applications in biology and chemistry, however, it is still a challenge to develop a low-cost...

Fabrication of nano-patterns of photoresist by ultraviolet lithography and oxygen plasma

Article Category: Papers

Publicado en línea: 26 nov 2020

Páginas: 359 - 364

Recibido: 16 sept 2020

DOI: https://doi.org/10.2478/jee-2020-0049

Palabras clave
nano-patterns, fabrication, ultraviolet lithography, oxygen plasma

© 2020 E Cheng et al., published by Sciendo

This work is licensed under the Creative Commons Attribution-NonCommercial-NoDerivatives 3.0 License.

Fabrication of nano-patterns of photoresist by ultraviolet lithography and oxygen plasma

Article Category: Papers

Publicado en línea: 26 nov 2020

Páginas: 359 - 364

Recibido: 16 sept 2020

DOI: https://doi.org/10.2478/jee-2020-0049

Palabras clavenano-patterns, fabrication, ultraviolet lithography, oxygen plasma

© 2020 E Cheng et al., published by Sciendo

This work is licensed under the Creative Commons Attribution-NonCommercial-NoDerivatives 3.0 License.

Palabras clave
nano-patterns, fabrication, ultraviolet lithography, oxygen plasma