<abstract xml:lang="en" xmlns="http://www.w3.org/1999/xhtml"><p>In 2011, we proposed a novel magnetron sputtering method. It involved the use of pulsed injection of working gas for the initiation and control of gas discharge during reactive sputtering of an AlN layer (Gas Injection Magnetron Sputtering — GIMS). Unfortunately, the presence of Al-Al bonds was found in XPS spectra of the AlN layers deposited by GIMS onto Si substrate. Our studies reported in this paper proved that the synchronization of time duration of the pulses of both gas injection and applied voltage, resulted in the elimination of Al-Al bonds in the AlN layer material, which was confirmed by the XPS studies. In our opinion the most probable reason of Al-Al bonds in the AlN layers deposited by the GIMS was the self-sputtering of the Al target in the final stage of the pulsed discharge.</p></abstract>

In 2011, we proposed a novel magnetron sputtering method. It involved the use of pulsed injection of working gas for the initiation and control of gas discharge during reactive sputtering of an AlN layer (Gas Injection Magnetron Sputtering — GIMS). Unfortunately, the presence of Al-Al bonds was found in XPS spectra of the AlN layers deposited by GIMS onto Si substrate. Our studies reported in this paper proved that the synchronization of time duration of the pulses of both gas injection and applied voltage, resulted in the elimination of Al-Al bonds in the AlN layer material, which was confirmed by the XPS studies. In our opinion the most probable reason of Al-Al bonds in the AlN layers deposited by the GIMS was the self-sputtering of the Al target in the final stage of the pulsed discharge.

Optimization of gas injection conditions during deposition of AlN layers by novel reactive GIMS method

Faculty of Materials Science, Warsaw University of Technology, Warsaw, Poland

National Centre for Nuclear Research, Swierk/Otwock, Poland

Dora Power Systems, Wilczyce/Wroclaw, Poland

Institute of Physics, Silesian University, Katowice, Poland

Materials Science-Poland

This work is licensed under the Creative Commons Attribution-NonCommercial-NoDerivatives 3.0 License.

In 2011, we proposed a novel magnetron sputtering method. It involved the use of pulsed injection of working gas for the initiation and control of gas...

Optimization of gas injection conditions during deposition of AlN layers by novel reactive GIMS method

Online veröffentlicht: 22. Juli 2014

Seitenbereich: 171 - 175

DOI: https://doi.org/10.2478/s13536-013-0169-6

Schlüsselwörter
plasma surface engineering, magnetron sputtering, aluminum nitride deposition

© 2013 Wroclaw University of Technology

This work is licensed under the Creative Commons Attribution-NonCommercial-NoDerivatives 3.0 License.

Optimization of gas injection conditions during deposition of AlN layers by novel reactive GIMS method

Online veröffentlicht: 22. Juli 2014

Seitenbereich: 171 - 175

DOI: https://doi.org/10.2478/s13536-013-0169-6

Schlüsselwörterplasma surface engineering, magnetron sputtering, aluminum nitride deposition

© 2013 Wroclaw University of Technology

This work is licensed under the Creative Commons Attribution-NonCommercial-NoDerivatives 3.0 License.

Schlüsselwörter
plasma surface engineering, magnetron sputtering, aluminum nitride deposition